Logotip IJS

Jamova 39, 1000 Ljubljana, Slovenia


Department of Surface Engineering and Optoelectronics

Odsek za tehnologijo površin in optoelektroniko

F 4

 

Local address: Teslova 30, 1000 Ljubljana, Slovenia

Tel. (+386)-1-477 3398, Fax. (+386)-1-477 3440

version: 1.5


Language:

Slovensko.........English


About the Institute

  1. Who Are We?
  2. Activities
  3. Laboratories
  4. Staff

Who Are We?

The Department of Surface Engineering and Optoelectronics -F4 was established in March 2003 after incorporation of the Institute of Surface Engineering and Optoelectronics - ITPO to Jožef Stefan Institute. It was established to perform basic and applied research. The main activities of the department are oriented to surface, interface and thin film analysis, surface engineering, plasma applications, vacuum optoelectronics, UHV techniques and technologies. A service facility is available to industry by offering characterization of samples by microanalytical and surface sensitive techniques. The department has cooperation with other Slovenian and foreign institutes, universities, industrial companies and laboratories. The Laboratory of surface and thin film analysis is included in the Slovenian National Centre for Microstructure and Surface Analysis. All researchers are active members of Slovenian Vacuum Society, which is a member of International Union for Vacuum Science, Technology and Applications (IUVSTA).

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Activities

  1. Surface analysis: Auger Electron Spectroscopy-(AES), X-Ray Photoelectron Spectroscopy-(XPS), Scanning Auger Microscopy-(SAM), Scanning Electron Microscopy-(SEM)
  2. Characterization of thin films and composite materials (TFA)
  3. Investigation of reactions on surfaces and interfaces Microanalysis of metals, glasses, ceramics etc. (EMPA, EDX)
  4. Plasma science and technologies
  5. Vacuum technique and design of vacuum systems
  6. Study of field emission from nanostructured materials
  7. Vacuum optoelectronic design, miniature cathode ray tubes (CRT), dewars for IR detectors
  8. Optoelectronic and luminescence materials
  9. Vacuum thermal insulation
  10. Development of new instruments for use at synchrotron radiation sources
  11. Ion implantation
  12. Consulting in the fields of surface and thin film technologies, vacuum technique, vacuum measurements, plasma technologies, materials and components for optoelectronics

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Laboratories

  1. LABORATORY FOR SURFACE AND THIN FILM ANALYSIS

As our needs for understanding of fundamental processes and technologies grow, so do our requirements for characterization and analysis.

X-RAY PHOTOELECTRON SPECTROMETER (XPS or ESCA)

SCANNING AUGER MICROPROBE (SAM)

X-Ray Photoelectron Spectroscopy (XPS or ESCA) and Auger Electron Spectroscopy (AES) are non-destructive surface analytical techniques that identify the chemical elements on the top few atomic layers of a surface. Thin Film Analysis (TFA) combines ion sputter etching of the surface with XPS/AES to measure the elemental composition of a sample as a function of depth. In our laboratory developed and patented method with sample rotation during XPS/AES depth profiling is beneficial in achieving uniform sputter etching resulting in high depth resolution profiles. The detection of all elements except hydrogen and helium is possible. The sensitivity for elemental detection is about 1 atomic %. Typical applications: the investigation of all vacuum compatible solids, surfaces, thin films, interfaces, powders, corrosion products, etc. Features: point analysis depth profiling and line scans.

XPS spectrum of Ag 3d, obtained with monochromatic x-ray source shows very high energy resolution (0.45 eV) of a new XPS spectrometer

AES sputter depth profiles (upper figure) of an as-deposited Ni/Al multilayer structure, and (lower figure) of the same multilayer after ion mixing with 350 keV Ar+ under a dose of 3x1016 ions/cm2.


Scanning Electron Microscope (SEM) with energy dispersive X-ray spectrometer (EDX)

A focused electron beam is scanned over the specimen which displays various interaction effects. The produced secondary electrons and backscattered electrons are used for imaging (SEM) of topographical or microstructural features on polished or rough surfaces. Electron probe microanalysis (EPMA) is based on the spectrometry of the characteristic X-rays emitted by the elements of a specimen under the effect of an incident electron beam. Energy-dispersive X-ray spectroscopy (EDX or EDS) enables qualitative and semiquantitative elemental analysis of solids. The detection of all elements with Z > 11 (sodium) is possible. The sensitivity for elemental detection is about 0,2 wt%. Specimens: metals, ceramics, glasses, geological materials, powders, layers, etc.


New X-ray Microscope for synchrotron light (TWINMIC )

In the frame of the fifth European framework we collaborated with seven partners at the development of new research methods and instrumentation based on the use of synchrotron light. We took part at the project ťMultipurpose transportable twin X-ray microscopy end station – TwinmicŤ to develop new X-ray microscope for synchrotron light with spatial resolution of 120 nm dedicated to research in physics, materials science, medicine, biology, biochemistry, and environmental science. The objective of this project was to build compact, transportable, multipurpose instrument based on the latest development in the field of X-ray optics, contrast methods, tomography, spectroscopy and new detectors. The microscope focalizes the beam of photons with energy from 150 to 2000 eV into a spot of 120 nm in diameter. The new concept of the microscope is the integration of the scanning and full-field imaging modes. The Twinmic microscope is now available at the synchrotron light source Elettra in Trieste. More information at:
http://www.elettra.trieste.it/twinmic/index.htm

Project TWINMIC: Translation modules for X-ray lenses in the new X-ray microscope TWINMIC for synchrotron light with resolution of 120 nm.


  1. PLASMA LABORATORY

 

Plasma lab covers the following fields of plasma science and technology: generation of low pressure discharges, plasma characterization, physical and chemical interactions of plasma with solid surfaces, chemical and structural analysis of samples treated in plasma. Within the past years, the lab established extensive collaboration with slovenian industry and research organizations throughout the world.

.....

Silver coin before and after plasma treatment

 

Radiofrequecy plasma

 


  1. LABORATORY FOR VACUUM TECHNIQUE

 

STUDY OF FIELD EMISSION FROM NANOSTRUCTURED MATERIALS

 

 

Field emission pattern of electrons from MoS2 nanotubes projected on screen of the field emission triode microscope

 

MINIATURE CATHODE RAY TUBES

Electrostatic (left) and electromagnetic (right) one inch CRT

One inch family of CRTs for professional monitors has been developed. Their construction is rugged to satisfy the most severe testing conditions in wide temperature range. Electrostatic or electromagnetic deflection are applied in accordance with customer needs.


ULTRAHIGH RESOLUTION SCREENS

SEM micrograph of phosphor layer cross-section

We have developed and optimized various deposition methods of a few microns thick luminescent layers. We use commercial phosphors. Deposition procedures are adopted to the properties of powders and substrates. Layers have high packing density and uniformity, as well as ultra-high resolution, high luminous efficiency, optimum contrast and lifetime.


 

STUDY OF MATERIAL PROPERTIES AND SURFACE REACTIONS IN CONNECTION WITH STABLE HIGH VACUUM

Vacuum insulating panel is far more efficient than materials, widely applied today.

Maintainance of a stable high vacuum within evacuated envelopes requires knowledge of reactions on internal surfaces. Their analysis and ability for pressure recording after evacuation are the fundamental tools for preparation of several vacuum components. They can be applied as optoelectronic devices, electron tubes, thermal insulating elements etc

 

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Staff

o        prof. dr. Anton Zalar, dipl. ing. met., head of department (anton.zalar@ijs.si), phone: (+386)-1-477-3402

o        dr. Vincenc Nemanič, dipl. ing. fiz.(vincenc.nemanic@ijs.si), phone: (+386)-1-477-3409

o        dr. Miran Mozetič, dipl. ing. fiz. (miran.mozetic@ijs.si), phone: (+386)-1-477-3405

o        Marko Žumer, dipl. ing. fiz. (marko.zumer@ijs.si), phone: (+386)-1-477-3435

o        Borut Praček, dipl. ing. met. (borut.pracek@ijs.si), phone: (+386)-1-477-3422

o        dr. Janez Kovač, dipl. ing. fiz. (janez.kovac@ijs.si), phone: (+386)-1-477-3403

o        Alenka Vesel, univ. dipl. fiz. (alenka.vesel@ijs.si), phone: (+386)-1-477-3502

o        dr. Bojan Zajec, univ. dipl. fiz. (bojan.zajec@ijs.si), phone: (+386)-1-477-3521

o        mag. Uroš Cvelbar, univ. dipl. fiz. (uros.cvelbar@ijs.si), phone: (+386)-1-477-3536

o        Aleksander Drenik, univ. dipl. fiz. (aleksander.drenik@ijs.si ) , tel: (+386)-1-477 3425

o        Ita Junkar, univ. inž. kem. inž. (ita.junkar@ijs.si ) , tel: (+386)-1-477 3536

o        Ruža Bolte, secretary (ruza.bolte@ijs.si), phone: (+386)-1-477-3498

o        Tatjana Filipič (tatjana.filipic@ijs.si), phone: (+386)-1-477-3425

o        Miha Kocmur, phone: (+386)-1-477-3428

o        Janez Trtnik, phone: (+386)-1-477-3423

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Last modified: 20. 12. 2005

Page maintained by dr Janez Kovač