Jamova 39, 1000 Ljubljana, Slovenia
Department
of Surface Engineering and Optoelectronics
Odsek za tehnologijo površin in
optoelektroniko
F 4
Local address: Teslova 30, 1000 Ljubljana, Slovenia
Tel. (+386)-1-477 3398, Fax. (+386)-1-477 3440
version: 1.5
Language:
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About the Institute
Who Are We?
The Department of Surface
Engineering and Optoelectronics -F4 was established in March 2003 after
incorporation of the Institute of Surface Engineering and Optoelectronics -
ITPO to Jožef Stefan Institute. It was established to perform basic and applied
research. The main activities of the department are oriented to surface,
interface and thin film analysis, surface engineering, plasma applications,
vacuum optoelectronics, UHV techniques and technologies. A service facility is
available to industry by offering characterization of samples by
microanalytical and surface sensitive techniques. The department has
cooperation with other Slovenian and foreign institutes, universities,
industrial companies and laboratories. The Laboratory of surface and thin film
analysis is included in the Slovenian National Centre for Microstructure and
Surface Analysis. All researchers are active members of Slovenian Vacuum Society, which is a
member of International Union for Vacuum Science, Technology and Applications (IUVSTA).
Activities
- Surface analysis: Auger Electron
Spectroscopy-(AES), X-Ray Photoelectron Spectroscopy-(XPS), Scanning Auger
Microscopy-(SAM), Scanning Electron Microscopy-(SEM)
- Characterization of thin films and composite
materials (TFA)
- Investigation of reactions on surfaces and
interfaces Microanalysis of metals, glasses, ceramics etc. (EMPA, EDX)
- Plasma science and technologies
- Vacuum technique and design of vacuum systems
- Study of field emission from nanostructured
materials
- Vacuum optoelectronic design, miniature cathode
ray tubes (CRT), dewars for IR detectors
- Optoelectronic and luminescence materials
- Vacuum thermal insulation
- Development of new instruments for use at
synchrotron radiation sources
- Ion implantation
- Consulting in the fields of surface and thin
film technologies, vacuum technique, vacuum measurements, plasma technologies,
materials and components for optoelectronics
Laboratories
- LABORATORY FOR SURFACE AND THIN FILM
ANALYSIS
As our needs for understanding of
fundamental processes and technologies grow, so do our requirements for
characterization and analysis.
SCANNING AUGER MICROPROBE (SAM)
X-Ray Photoelectron
Spectroscopy (XPS or ESCA) and Auger Electron Spectroscopy (AES) are
non-destructive surface analytical techniques that identify the chemical
elements on the top few atomic layers of a surface. Thin Film Analysis (TFA)
combines ion sputter etching of the surface with XPS/AES to measure the
elemental composition of a sample as a function of depth. In our laboratory
developed and patented method with sample rotation during XPS/AES depth
profiling is beneficial in achieving uniform sputter etching resulting in high
depth resolution profiles. The detection of all elements except hydrogen and
helium is possible. The sensitivity for elemental detection is about 1 atomic
%. Typical applications: the investigation of all vacuum compatible solids,
surfaces, thin films, interfaces, powders, corrosion products, etc. Features:
point analysis depth profiling and line scans.
XPS spectrum of Ag 3d, obtained with monochromatic x-ray
source shows very high energy resolution (0.45 eV) of a new XPS spectrometer
AES sputter depth profiles (upper figure) of an as-deposited
Ni/Al multilayer structure, and (lower figure) of the same multilayer after ion
mixing with 350 keV Ar+ under a dose of 3x1016 ions/cm2.
Scanning Electron Microscope (SEM) with energy dispersive X-ray
spectrometer (EDX)
A focused electron beam is
scanned over the specimen which displays various interaction effects. The
produced secondary electrons and backscattered electrons are used for imaging
(SEM) of topographical or microstructural features on polished or rough
surfaces. Electron probe microanalysis (EPMA) is based on the spectrometry of
the characteristic X-rays emitted by the elements of a specimen under the
effect of an incident electron beam. Energy-dispersive X-ray spectroscopy (EDX
or EDS) enables qualitative and semiquantitative elemental analysis of solids.
The detection of all elements with Z > 11 (sodium) is possible. The
sensitivity for elemental detection is about 0,2 wt%. Specimens: metals,
ceramics, glasses, geological materials, powders, layers, etc.
New X-ray Microscope for synchrotron light (TWINMIC )
In the frame of the fifth
European framework we collaborated with seven partners at the development of
new research methods and instrumentation based on the use of synchrotron light.
We took part at the project ťMultipurpose transportable twin X-ray microscopy
end station TwinmicŤ to develop new X-ray microscope for synchrotron light
with spatial resolution of 120 nm dedicated to research in physics, materials
science, medicine, biology, biochemistry, and environmental science. The objective
of this project was to build compact, transportable, multipurpose instrument
based on the latest development in the field of X-ray optics, contrast methods,
tomography, spectroscopy and new detectors. The microscope focalizes the beam
of photons with energy from 150 to 2000 eV into a spot of 120 nm in diameter.
The new concept of the microscope is the integration of the scanning and
full-field imaging modes. The Twinmic microscope is now available at the
synchrotron light source Elettra in Trieste. More information at:
http://www.elettra.trieste.it/twinmic/index.htm
Project TWINMIC: Translation
modules for X-ray lenses in the new X-ray microscope TWINMIC for synchrotron
light with resolution of 120 nm.
- PLASMA LABORATORY
Plasma lab covers the following
fields of plasma science and technology: generation of low pressure discharges,
plasma characterization, physical and chemical interactions of plasma with
solid surfaces, chemical and structural analysis of samples treated in plasma.
Within the past years, the lab established extensive collaboration with
slovenian industry and research organizations throughout the world.
.....
Silver coin before and after plasma treatment
Radiofrequecy plasma
- LABORATORY FOR VACUUM TECHNIQUE
Field
emission pattern of electrons from MoS2 nanotubes projected on
screen of the field emission triode microscope
MINIATURE CATHODE RAY TUBES
Electrostatic (left) and electromagnetic (right) one inch
CRT
One inch family of CRTs for
professional monitors has been developed. Their construction is rugged to
satisfy the most severe testing conditions in wide temperature range.
Electrostatic or electromagnetic deflection are applied in accordance with
customer needs.
SEM micrograph of phosphor layer cross-section
We have developed and
optimized various deposition methods of a few microns thick luminescent layers.
We use commercial phosphors. Deposition procedures are adopted to the
properties of powders and substrates. Layers have high packing density and
uniformity, as well as ultra-high resolution, high luminous efficiency, optimum
contrast and lifetime.
Vacuum insulating panel is far more
efficient than materials, widely applied today.
Maintainance
of a stable high vacuum within evacuated envelopes requires knowledge of
reactions on internal surfaces. Their analysis and ability for pressure
recording after evacuation are the fundamental tools for preparation of several
vacuum components. They can be applied as optoelectronic devices, electron
tubes, thermal insulating elements etc